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Hitachi Chemical to Build Photosensitive Film Center

    Hitachi Chemical announced on July 17th, it plans to invest Yen 520 million (approximately US$4.9 million) in a new R & D center for photosensitive dry film for printed wiring boards (PWBs) at the Suzhou site, Jiangsu province, eastern China.
   Hitachi Chemical commenced production of the Suzhou plant this May for the the manufacture of photosensitive dry film for PWBs with a capacity of 50 million m2 per year.

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